{"id":6095,"date":"2013-10-19T10:16:23","date_gmt":"2013-10-19T10:16:23","guid":{"rendered":"http:\/\/hilase.test\/?post_type=akce&#038;p=6095"},"modified":"2013-10-19T10:16:23","modified_gmt":"2013-10-19T10:16:23","slug":"fundamental-property-of-6-x-nm-euv-emission-for-the-next-generation-lithography","status":"publish","type":"akce","link":"https:\/\/www.hilase.cz\/en\/akce\/fundamental-property-of-6-x-nm-euv-emission-for-the-next-generation-lithography\/","title":{"rendered":"Fundamental property of 6.X-nm EUV emission for the next generation lithography"},"content":{"rendered":"","protected":false},"author":1,"template":"","class_list":["post-6095","akce","type-akce","status-publish","hentry"],"acf":{"datum_od":"16. 07. 2012","misto":"HiLASE","obsah":[{"acf_fc_layout":"text","text":"<p><strong>Seminar &#8211; Dr. Takeshi Higashiguchi:\u00a0<\/strong><\/p>\n<p>&#8220;Fundamental property of 6.X-nm EUV emission for the next generation lithography&#8221;<\/p>\n","oddelovace":"none"}]},"yoast_head":"<!-- This site is optimized with the Yoast SEO plugin v23.9 - 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